The NS300 series is the high productivity scrubber system for 300mm wafer process based on TEL’s industry-leading Coater/Developer platform providing excellent reliability and stability. The system normally has D.I. Water brush clean and originally designed Atomized Spray (AS), bevel brush is also capable to enhance its performance efficiently.

NS300+ 200mm Conversionは、TELが提供するNS300+ HTで信頼性と安定性の実績があるプロセスモジュールを搭載し、300mm次世代デバイス向け洗浄プロセス技術が盛り込まれた、200mm/150mm対応のスクラバー洗浄装置です。

TEL/TOKYO ELECTRON NS 300 z是一款晶圆和掩模洗涤器，设计用于对各种晶圆尺寸和材料进行高效、安全的清洗，并具有专利清洗方法和安全特性，以确保最佳性能。

TEL/TOKYO ELECTRON NS 300 z晶圆和掩模洗涤器提供高精度清洗，具有集成器件层微控制器、独特的泡泡泵工具、基板冷却工具和减振资产等先进功能，为用户提供高效、精确和低级别的污染控制，以及可靠、低维护的操作。

TEL/TOKYO ELECTRON NS 300 z是一款晶圓和掩模洗滌器，設計用於對各種晶圓尺寸和材料進行高效、安全的清洗，並具有專利清洗方法和安全特性，以確保最佳性能。

TEL / TOKYO ELECTRON NS 300z is a wafer and mask scrubber that provides high performance substrate cleaning. It offers excellent particle removal, enabling the particle contamination down to the nano-level needed in advanced production processes.

The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 …

The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8 …

TEL/TOKYO ELECTRON NS 300是一款高度先进、可靠的晶圆和掩模洗涤器,具有自动化的三轴运动控制系统、双侧磨砂臂、顶侧磨砂喷射技术以及三个阶段的洗涤,可提高IC的产量和可靠性。

TEL / TOKYO ELECTRON NS 300z is a wafer and mask scrubber designed for efficient and safe cleaning of a variety of wafer sizes and materials, with a patented cleaning method and safety features to ensure optimal performance.